Influence of electrospray deposition on C₆₀ molecular assemblies

• Antoine Hinaut,
• Sebastian Scherb,
• Sara Freund,
• Zhao Liu,
• Thilo Glatzel and
• Ernst Meyer

Beilstein J. Nanotechnol. 2021, 12, 552–558, doi:10.3762/bjnano.12.45

• method can yield single isolated molecules accompanied by surface modifications. Keywords: alkali halide; Au(111); bulk insulator; C60; electrospray; electrospray deposition; fullerene; high-vacuum electrospray deposition (HV-ESD); molecular assembly; nc-AFM; NiO; single molecule; thermal evaporation

• microscope (nc-AFM) working at room temperature to study formation and shape of C60 islands on three substrates with different intrinsic properties. These are, first, Au(111), a metal surface widely used in SPM studies, second, KBr(001), a bulk insulator allowing for the decoupling of molecular species and

Self-assembly and spectroscopic fingerprints of photoactive pyrenyl tectons on hBN/Cu(111)

• Domenik M. Zimmermann,
• Knud Seufert,
• Luka Ðorđević,
• Tobias Hoh,
• Sushobhan Joshi,
• Tomas Marangoni,
• Davide Bonifazi and
• Willi Auwärter

Beilstein J. Nanotechnol. 2020, 11, 1470–1483, doi:10.3762/bjnano.11.130

• properties in organic layers relied on bulk insulator supports [14][15][16]. As a promising alternative to bulk insulators, ultrathin dielectric films can act as decoupling layers but maintain the possibility to perform STM and STS measurements [17]. Atomically-thin hBN sheets attracted considerable interest

Electrospray deposition of organic molecules on bulk insulator surfaces

• Antoine Hinaut,
• Rémy Pawlak,
• Ernst Meyer and
• Thilo Glatzel

Beilstein J. Nanotechnol. 2015, 6, 1927–1934, doi:10.3762/bjnano.6.195

• molecules which are more suitable for future devices and could incorporate additional functions and anchoring groups. In this work we present the adaptation of a UHV-ESI system to deposit triply fused porphyrin molecules on a bulk insulator KBr(001) sample and the analysis of theses deposits by high

• resolution AFM measurements at RT and under UHV conditions. First, it is shown that the applied solvents do not impact the deposits and the measurements. The coverage of the molecules on the bulk insulator surface can be controlled and adopted to the needs of the AFM measurement. However, at large coverage

• measurements by applying a bias voltage of up to ±10 V, which is the limit of the AFM system. These large electrostatic forces induced difficult scan conditions and we were not able to study the organization of the molecules in more detail. Indeed, surfaces charges of bulk insulator samples have already been